Nanoscribe produces compact and easy-to-operate table-top laser lithography systems, allowing for true three-dimensional nanostructures in commercially available photoresists. Furthermore, we provide photoresists specially developed for the needs of 3D laser lithography (also known as Direct Laser Writing) from in-house developments: IP-L, IP-G as well as chalcogenide glasses. Finally, we also offer advice in casting 3D polymer templates into metals or semiconductors.
Newsletter (Nov 2014)


Maskless Lithography: 2D manufacturing by direct laser writing
Unfeelability Cloak Protects the Princess from the Pea: Mechanical metamaterials open new dimensions
Brandenburg Gate: 25 years after the fall of the Berlin Wall
Newsticker: Nanoscribe Grows
Newsticker: Visit of HeKKSaGOn
Website Relaunch: New design, optimized research, and impressive gallery of applications
Nanoscribe Worldwide: New distributor for South Korea

Newsletter (Jan 2014)


The global market for 3D printing has a huge growth potential, especially in market segments where applications demand highly complex part geo-metries or a high degree of individual-ization. For medical applications, 3D printing is expected to grow at 15.4% CAGR from 2013 to hit 965.5 USD in 2019, as a recent market research study found out*. The growth is fueled by an increase in investments made in R&D for 3D printing technologies.
Newsletter (April 2012)


In the current edition of Nanoscribe’s “News and Reviews” we would like to provide you with information on a high-impact application on helical micromachines of our customer, the ETH-Zürich (CH), written with the Photonic Professional. We also present the new features and improved usability of our control software, NanoWrite 1.6. In the news ticker you´ll find more information about current developments and exhibitions. The newsletter can either be downloaded as a .pdf or you can follow this link.
Dip-in Laser Lithography (DiLL)


With our innovative and patent-pending DiLL technology, users of Nanoscribe's Photonic Professional systems can now fabricate high-resolution 3D micro- and nanostructures far taller than the working distance of the objective lens.
CLEO 2010 (Mai 18 - 20, 2010)
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